The “DT” Dust Tight model guarantees excellent polishing due to a patented system, and reduces operator exposure and dust contamination in the production room. Dust Tight systems are modularly upgradable to “C” Containment and “HC” High Containment washable solutions.
Read moreThe “C” Containment ≤OEB4 model guarantees excellent polishing due to a patented system and it is used for toxic products, avoiding operator and production room contamination. Containment systems are modularly upgradable to “HC” High Containment ≤OEB5 and washable.
Read more“HC” Containment ≤OEB5 washable model guarantees excellent polishing due to a patented system and it is used for highly toxic drugs, avoiding operator and production room contamination.
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